Coat Developer Equipment

ZHT-200, 6-8 inch parallel

  1. Flexible combination, multi-process support
  2. Support Inline lithography and KRF process
  3. Support Com 150mm&200mm product
  4. Support composite plate, support circulating water temperature control cooling plate
  5. Support digital collection of process parameters
  6. Support remote monitoring system
  7. Support automated transfer system
  8. Support the EAP system


Coat Developer Equipment

ZHT-150

  1. Integrated design small footprint more stability
  2. Support Com 100mm&150mm product
  3. Support full transparent product
  4. Support G-line, I-line process
  5. Support SECS communication
  6. Offer different design for customer special request
  7. Parts made in China, low cost


Coat Developer Equipment

ZHT-300

  1. Support Com 200mm&300mm product
  2. Camera installed in process unit and transfer area
  3. High throughput, WPH can up to 180
  4. Stack layout, high throughput per unit area
  5. R&D precision hot plate, support high technology process
  6. Support SECS communication and AMHS system
  7. Offer different design for customer special request
  8. Parts made in China, low cost

Metal Lift-off

ZHL-200

  1. Support Com150mm&200mm inch product
  2. Class10 environment and ESD eliminate system
  3. Stream/ HPC fan/HPC needle/Nano etc. for customer select
  4. Chemical recycle system and metal collection system
  5. Pump pressure up to 4000psi, effectively reduce process time
  6. CCTV camera installed in process unit and transfer area
  7. Offer different design for customer special request


Single wafer Scrubber clean tool

ZHS-200, 6-inch, 8-inch and 12-inch equipment

  1. High throughput, WPH can up to 380
  2. Nano/brush/Jet etc. different clean mode for customer select
  3. Class10 environment and ESD eliminate system
  4. Offer different design for customer special request
  5. CCTV camera installed in process unit and transfer area
  6. New version operation system and multi function of software