Application fields: silicon-based semiconductors, compound semiconductors (GaAs, GaN, SiC, filters), MEMS, advanced packaging, and other fields.
Product advantages:
- Stacked modular layout maximizes output per unit of floor space
- Fully in-house developed architecture with reliable, independently controlled software source code, deep integration with customer IT systems, and expanded data interfaces
- Supports a wide range of chemical processes for front-end fabrication and packaging, meeting multilayer process requirements
- Supports substrates with various structures and thicknesses, accommodating both transparent and opaque wafers
- A high proportion of domestically sourced core components significantly reduces costs and delivers clear total cost of ownership (TCO) advantages throughout the equipment lifecycle
- Highly customizable configurations give customers greater flexibility and choice
- Dual robot arms share the workload, reducing fatigue risk
- No additional aligner unit is required, delivering greater transfer precision, flexibility, and reliability
- Stable control of chamber flow and pressure reduces the risk of thick-resist defects
- Comprehensive service support, including local service and proactive maintenance
Technical Parameters:
- Speed range: 0-4000rpm
- Acceleration range: 0-50000rpm/sec
- Speed accuracy: ± 1rpm
- Hot plate temperature range: 50-200 ℃
- Temperature uniformity of hot plate:
50.0℃ ~ 120.0℃ : Range ≤ 0.6℃
120.1℃ ~ 150.0℃ : Range ≤ 0.8℃
150.1℃ ~ 200.0℃ : Range ≤ 1.2℃
- Cold Plate Temperature Range: 20-30℃
- Uniformity of cold plate temperature: ±0.2℃
- Applicable photoresist: Max: 20000CP
- Rubber pump type: Cylinder/Motor Type pump
- Photoresist or developer tubing: PFA
- Traffic monitoring: Flowmeter + Contra ejaculation sensor/Finflow/ ultrasonic flowmeter