Coat Developer Equipment


ZHT-300 R&D by ZHONG HONG ,300mm wafer coat&develop process, widely used in semiconductor and advanced package. Support I-line and DUV process.

Product advantages:

  1. Support Com 200mm&300mm product
  2. Camera installed in process unit and transfer area
  3. High throughput, WPH can up to 180
  4. Stack layout, high throughput per unit area
  5. R&D precision hot plate, support high technology process
  6. Support SECS communication and AMHS system
  7. Offer different design for customer special request
  8. Parts made in China, low cost

Independent research and development

  • Software Running
  • Mechanical Transmission
  • Circuit Module
  • Unit for Coating
Compound Semiconductor

Process capacity: > 0.18um
Products: Gallium Arsenide (GaAs),
Gallium Nitride (GaN),
Silicon Carbide (SiC), Filter (Filter)


Process capacity: > 0.18um
Product: MEMS

Silicon-based Semiconductor

Process capacity: > 90nm
Products: IGBT, CMOS, MPU, MCU,
DSP, RAM, ROM, Flash